Freestanding Ge/SiO2 Core/Shell Nanoparticles Formed via Metastable SiO2 Hollow Nanospheres on a Si

Chemical Vapor Deposition 14(11-12) 331-333

https://doi.org/10.1002/cvde.200804264

Kwang-Tae Park, Han-Don Um, Sang-Won Jee, Jin-Young Jung, Yun Chang Park, Jun Mo Yang, and Jung-Ho Lee

Abstract

Communication: Freestanding Ge/SiO2 core/shell nanoparticles were synthesized via metastable SiO2 hollow nanospheres by atmospheric-pressure thermal chemical vapor deposition (APCVD) using SiCl4 and GeCl4 source gases. The Ge-core and SiO2-shell thicknesses could be controlled by adjusting the annealing time and the source gas ratio. These nanoparticles might be useful as labeling markers for fluorescent applications.